Molybdenum Quasi Phase-Only Masks Improve EUV Imaging (NYCU, TSMC)

Researchers at National Yang Ming Chiao Tung University and TSMC published a technical paper titled “High contrast EUV imaging enabled by topological quasi phase-only masks.”

Abstract Excerpt: “Here, we propose a paradigm shift in EUV PSM technology by introducing molybdenum (Mo)-based quasi phase-only masks (quasi-POMs) with high reflectivity and minimal absorption. Through rigorous electromagnetic simulations, we demonstrate that Mo quasi-POMs deliver up to 35% higher image contrast, a fivefold increase in common focus window, and 92% lower peak telecentricity error than conventional tantalum (Ta)-based absorbers, enabling 12.5-nm half-pitch resolution for 0.33 numerical aperture (NA) EUV systems with monopole illumination.”

Find the technical paper here. August 2026.

Po-Hsun Fang, Pokai Chang, Chaowei Huang, Lee-Feng Chen, Yen-Liang Chen, and Peichen Yu, “High contrast EUV imaging enabled by topological quasi phase-only masks,” Opt. Express 34, 30091-30105 (2026)

 

 

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