Pt-W Alloy Shows Potential For Thinner High-NA EUV Mask Absorbers (Chinese Academy of Sciences et al.)

Researchers at Chinese Academy of Sciences, Jilin University, State Key Laboratory of Advanced Manufacturing for Optical Systems, and University of Chinese Academy of Sciences published a technical paper titled “Evaluating an alternative Pt-W alloy as a low-n EUV mask absorber: Film properties and imaging performance.”

“In this study, we investigate an alternative Pt-W alloy as a next-generation low-n EUV mask absorber,” states the paper.

Find the technical paper here. August 2026.

Li, Zhonghua, Haolong Tang, Xiaoyi Wang, Hongwei Tian, Yanchao Wang, and Hanwen Hu. “Evaluating an alternative Pt-W alloy as a low-n EUV mask absorber: Film properties and imaging performance.” iScience, August 2026. https://doi.org/10.1016/j.isci.2026.116912. Attribution-NonCommercial 4.0 International.

 

 

The post Pt-W Alloy Shows Potential For Thinner High-NA EUV Mask Absorbers (Chinese Academy of Sciences et al.) appeared first on Semiconductor Engineering.